Tuning of Schottky barrier height using oxygen-inserted (OI) layers and fluorine implantation
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چکیده
منابع مشابه
Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing
The Schottky junction source/drain structure has great potential to replace the traditional p/n junction source/drain structure of the future ultra-scaled metal-oxide-semiconductor field effect transistors (MOSFETs), as it can form ultimately shallow junctions. However, the effective Schottky barrier height (SBH) of the Schottky junction needs to be tuned to be lower than 100 meV in order to ob...
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2020
ISSN: 2158-3226
DOI: 10.1063/1.5144507